Intended Audience

This week-long short course is designed for the scientist, engineer, manager or technician interested in learning optical principles of projection lithography systems.  A strong undergraduate-level mathematical background and a basic knowledge of optics are helpful.

Learning objectives

Participants who successfully complete this workshop will be able to:

  • Describe the basic theory of image formation in a lithographic system.
  • Understand lithographic optical principles and their dependencies, like partial coherence sigma, resolution, exposure latitude, phase masks, critical dimension, etc.
  • Understand and describe the importance of polarization in lithographic projectors
  • Operate a lithographic simulator for basic calculations (Synopsis)
  • Design and fabricate Cr-on-glass masks with the University of Arizona Maskless Lithography Tool (MLT)
  • Expose photoresist with amplitude and phase masks on a g-line projection exposure tool, develop and analyze resulting patterns.
  • Expose photoresist with an interference lithography tool
  • Expose photoresist with a liquid-crystal on silicon (LCOS) spatial light modulator
  • Write lithographic patterns with a multiple-photon femto-second laser system
  • List state-of-the-art performance parameters
  • Understand potential next-generation technology


Participants will experience a combination of lecture and hands-on laboratory sessions.  Each day is designed to cover different topics. Classes are scheduled to be held in the world-famous College of Optical Sciences on the beautiful University of Arizona campus in Tucson, Arizona. Class size is limited to provide a quality learning environment.