This week-long short course is designed for the scientist, engineer, manager or technician interested in learning optical principles of projection lithography systems. A strong undergraduate-level mathematical background and a basic knowledge of optics are helpful.
Participants who successfully complete this workshop will be able to:
- Describe the basic theory of image formation in a lithographic system.
- Understand lithographic optical principles and their dependencies, like partial coherence sigma, resolution, exposure latitude, phase masks, critical dimension, etc.
- Understand and describe the importance of polarization in lithographic projectors
- Operate a lithographic simulator for basic calculations (Synopsis)
- Design and fabricate Cr-on-glass masks with the University of Arizona Maskless Lithography Tool (MLT)
- Expose photoresist with amplitude and phase masks on a g-line projection exposure tool, develop and analyze resulting patterns.
- Expose photoresist with an interference lithography tool
- Expose photoresist with a liquid-crystal on silicon (LCOS) spatial light modulator
- Write lithographic patterns with a multiple-photon femto-second laser system
- List state-of-the-art performance parameters
- Understand potential next-generation technology
Participants will experience a combination of lecture and hands-on laboratory sessions. Each day is designed to cover different topics. Classes are scheduled to be held in the world-famous College of Optical Sciences on the beautiful University of Arizona campus in Tucson, Arizona. Class size is limited to provide a quality learning environment.