EUV Nanophotonics

Extreme Ultraviolet (EUV) radiation refers to the electromagnetic spectrum in the wavelength range of approximately 10 to 124 nanometers (nm). This range is crucial for advanced applications such as semiconductor lithography, where it enables the creation of extremely fine features on integrated circuits, driving forward the miniaturization and performance of electronic devices. However, the development of optical elements for EUV is challenging due to the strong absorption of EUV photons by most materials, necessitating specialized and innovative approaches to design and fabrication.

The primary types of optical elements used in the EUV range include Distributed Bragg Reflectors (DBR) and Fresnel Zone Plates (FZPs). DBR mirrors, composed of alternating layers of materials with different refractive indices, rely on constructive interference to reflect EUV light efficiently. FZPs, on the other hand, are diffractive optical elements that focus light by utilizing a series of concentric rings that alternately transmit and block light. Both DBR mirrors and FZPs are used to create the optical elements, e.g., lenses, needed in EUV lithography. 

The QPANG lab is actively developing new classes of optical elements to operate within the EUV wavelength range. This endeavor compels us to explore and invent new concepts and methodologies to create novel optical devices capable of functioning across all wavelengths, pushing the boundaries of current photonic technologies.