CMOS Nanophotonics
Complementary Metal-Oxide-Semiconductor (CMOS) technology is a cornerstone of modern electronics, widely used in integrated circuits for its low power consumption and high noise immunity. CMOS foundries are essential in this ecosystem, providing the manufacturing infrastructure to produce complex semiconductor devices at scale. CMOS chips consist of two main sections: the Front-End of Line (FEOL), which includes the transistors and other active components, and the Back-End of Line (BEOL), which involves the interconnects and metal layers that connect the various components on the chip.
The BEOL is particularly notable for its intricate structure, composed of multiple layers of stacked metallic wires with dimensions on the order of 100 nanometers. These layers are crucial for signal routing and power distribution within the chip. The unique properties of the BEOL can be harnessed to create advanced metal-optic devices, metasurfaces, and metamaterials. These elements can manipulate light at the nanoscale, enabling a new class of photonic applications.
The QPANG lab is interested in developing schemes to design such optical devices within the CMOS framework. Our research focuses on advanced imaging systems, modulators, and photonic computers, leveraging the capabilities of CMOS technology. Our ultimate goal is to realize comprehensive design kits for the building blocks of metal optics and meta-optics in CMOS foundries, develop robust postprocessing techniques, and demonstrate nanophotonic optoelectronic devices fully fabricated in CMOS at the system level. This approach promises to integrate photonics and electronics seamlessly, paving the way for next-generation technologies.