CGH design spans decades of applied and theoretical research.  Diffractive Optical Elements (DOE) are CGHs used in optical systems. Fabrication of these devices has traditionally been time-consuming, using binary photomasks and semiconductor foundry resources. The purpose of this workshop is to provide participants with a hands-on learning opportunity for design and fabrication of these devices using the Maskless Lithography Tool (MLT) and LCOS spatial light modulators at the College of Optical Sciences. Through a series of lectures, computer training, and laboratory experiments, participants will be exposed to processes needed to design and build physical devices.

Intended audience

The course is geared towards scientists, engineers, managers, and researchers interested in exploring fundamentals of Computer Generated Holography, Diffractive Optical Elements, LCOS arrays and Maskless Grayscale Lithography who want to gain hands-on, working knowledge in this field. A strong undergraduate-level mathematical background and a basic knowledge of optics are helpful.

Learning objectives

Participants who successfully complete this three day course will be able to:

  • Specify, analyze, design and test properties of Diffractive Optical Elements (DOEs)
  • Specify, analyze, design, and test properties of CGH display holograms
  • Design and use DOEs for optical testing applications
  • Describe basic fabrication procedures used in fabricating CGHs and DOEs with MLT and LCOS arrays
  • Fabricate several types of CGHs and DOEs using the MLT
  • Design and test DOEs and CGHs with LCOS arrays